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FHD flame hydrolysis deposition equipment
The FHD deposition system is designed to deposit silicon on the substrate and silicate (silica) on the substrate in the shortest possible time, and is particularly suitable for silica deposition in the optical waveguide process, with a film thickness of more than 25 microns. MORE +
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First generation FHD deposition equipment
FHD coating equipment, TGV copper plating equipment as the entrance, layout semiconductor optical quantum integrated chips and advanced packaging process synthetic quartz and optical fiber equipment and product lines, can replace imported equipment. MORE +
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